Natcast (short for The National Center for the Advancement of Semiconductor Technology) is a new, purpose-built, non-profit entity created to operate the National Semiconductor Technology Center (NSTC) consortium, established by the CHIPS Act of the U.S. government.

Working at Natcast represents an opportunity to help extend America’s leadership in semiconductor technology, significantly reduce the time and cost of moving from idea to commercialization, and build and sustain a semiconductor workforce development ecosystem.

These efforts to advance semiconductor technology and seed new industries built on the capabilities of a wide range of advanced chips hold the potential to benefit the country and the world for generations to come.

Principal Research Scientist, E-Beam Lithography

Tempe, AZ

In this role you will pioneer advanced e-beam lithography techniques, driving innovation in nanoscale patterning while advancing America's capabilities in next-generation semiconductor device fabrication.

Every day you will push the boundaries of sub-10nm resolution, develop novel patterning approaches, and collaborate with industry partners to enable breakthrough semiconductor innovations through sophisticated e-beam technologies.

To thrive in this role you must combine deep e-beam expertise with innovative thinking, demonstrating the ability to both advance fundamental capabilities and translate research into practical solutions.

Natcast stands at the forefront of semiconductor research and engineering, serving as a crucial hub for innovation in the U.S. semiconductor ecosystem. Through the National Semiconductor Technology Center (NSTC), Natcast drives technological advancement through collaborative partnerships, cutting-edge facilities, and a commitment to maintaining U.S. leadership in semiconductor technology.

This position plays a crucial role in advancing semiconductor patterning capabilities. The role requires sophisticated technical expertise combined with strong research leadership to drive innovation in e-beam lithography and enable next-generation device development.

Responsibilities:

• Lead advanced e-beam lithography research initiatives

• Develop novel sub-10nm patterning techniques

• Drive process integration innovation

• Advance resist and materials characterization

• Guide design enablement strategies

• Direct process window optimization

• Lead CD control advancement

• Foster industry collaborations

• Drive technical publications and patents

• Mentor research team members

• Ensure alignment with industry roadmaps

Required Skills and Experience:

• Ph.D. in Electrical Engineering, Physics, or related field

• 15+ years semiconductor research experience

• Deep expertise in e-beam lithography

• Strong background in nanofabrication

• Excellence in process integration

• Track record of technical innovation

• Significant publication history

• Pattern generation expertise

• Demonstrated research leadership

• Materials characterization experience

• Industry collaboration success

Preferred Skills and Experience:

• Experience with multiple e-beam platforms

• Background in resist development

• Knowledge of advanced logic processes

• Memory device expertise

• Process modeling capabilities

• International research recognition

Ready to advance semiconductor innovation through e-beam excellence? Join our team and help develop the patterning technologies that will strengthen domestic semiconductor capabilities for generations to come. Apply now to contribute to this critical mission!

Natcast is an equal opportunity employer. We do not discriminate based on race, color, religion, gender, gender expression, age, national origin, disability, marital status, sexual orientation, military status, or any protected attribute. We encourage qualified candidates from all backgrounds to apply and join us in our mission. If you require accommodation at any stage of the application process due to a disability, please let us know.

We collect and manage personal data in compliance with data privacy regulations and best practices.